featured products

• VisEdge CV300R-EP – All-in-one edge inspection/metrology system designed to control yield excursions caused by issues with wafer edge profile, film edge concentricity and edge defects.
• Aleris 8330 – A high throughput film metrology tool that provides a reliable, low cost-of-ownership solution for production monitoring of non-critical films at the 32nm node and beyond.
• TeraFabHT – Reticle defect inspection system providing next-generation haze sensitivity for leading-edge single-die and multi-die masks, to warn a fab of reticle defects before they print on the wafer.
• eDR-5210S – High resolution e-beam wafer defect review system with new Reticle Defect Review and Critical Point Inspection capabilities, for accelerated identification of systematic defects from reticles, design hot spots and other sources.

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Results:

• A faster path from data to decisions
• Quicker response to changes in the market
• Reliable, high performance products
• Higher profitability and ROI